Methodology for generating exposure tool specifications for alternating phase-shift mask application for 70-nm node
- 著者名:
Lai, K. ( IBM Microelectronics (USA) ) Gallatin, G.M. ( IBM Thomas J. Watson Research Ctr. (USA) ) Rosenbluth, A.E. Fonseca, C.A. ( IBM Microelectronics (USA) ) Liebmann, L.W. Progler, C.J. ( IBM Corp. (USA) ) - 掲載資料名:
- Optical Microlithography XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4691
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 336
- 終了ページ:
- 347
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- 言語:
- 英語
- 請求記号:
- P63600/4691
- 資料種別:
- 国際会議録
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