Subwavelength lithography: an impact of photomask errors on cricuit performance

Subwavelength lithography: an impact of photomask errors on cricuit performance

著者名:

Karklin, L. ( Numerical Technologies, Inc. (USA) )
Mazor, S.
Joshi, D.
Balasinski, A. ( Cypress Semiconductor Corp. (USA) )
Axelrad, V. ( Sequoia Design Systems, Inc. (USA) )

掲載資料名:

Optical Microlithography XV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4691

発行年:

2002

巻:

Part One

開始ページ:

259

終了ページ:

267

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

言語:

英語

請求記号:

P63600/4691

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012525
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2002 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.05-2002.03.08

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