Optimization of process condition to balance MEF and OPC for alternating PSM: control of forbidden pitches
- 著者名:
- Kim, K. ( Texas Instruments Inc. (USA) )
- Choi, Y.S.
- Socha, R.J. ( ASML (Netherlands) )
- Flagello, D.G.
- 掲載資料名:
- Optical Microlithography XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4691
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 240
- 終了ページ:
- 246
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- 言語:
- 英語
- 請求記号:
- P63600/4691
- 資料種別:
- 国際会議録
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SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
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SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |