Complex 2D pattern lithography at λ/4 resolution using chromeless phase lithography (CPL)
- 著者名:
Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) ) Chen, J.F. Laidig, T.L. Hsu, S.D. Wampler, K.E. Socha, R.J. ( ASML (USA) ) Petersen, J.S. ( Petersen Advanced Lithography, Inc. (USA) ) - 掲載資料名:
- Optical Microlithography XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4691
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 196
- 終了ページ:
- 214
- 総ページ数:
- 19
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- 言語:
- 英語
- 請求記号:
- P63600/4691
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL)
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |