Patterning half-wavelength DRAM cell using chromeless phase lithography (CPL)
- 著者名:
Hsu, C. ( ASML MaskTools, Inc. (USA) ) Chu, R. ( Nanya Technology Corp. (Taiwan) ) Chen, J.F. ( ASML MaskTools, Inc. (USA) ) Van Den Broeke, D.J. Shi, X. Hsu, S.D. Wang, T. ( Nanya Technology Corp. (Taiwan) ) - 掲載資料名:
- Optical Microlithography XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4691
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 76
- 終了ページ:
- 88
- 総ページ数:
- 13
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- 言語:
- 英語
- 請求記号:
- P63600/4691
- 資料種別:
- 国際会議録
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Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL)
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Full-chip manufacturing reliability check implementation for 90-nm and 65-nm nodes using CPL and DDL
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