Flare and its impact on low-k1 KrF and ArF lithography

Flare and its impact on low-k1 KrF and ArF lithography

著者名:

La Fontaine, B. ( Advanced Micro Devices, Inc. (USA) )

Dusa, M.V. ( ASML (USA) )

Acheta, A. ( Advanced Micro Devices, Inc. (USA) )

Chen, C.

Bourov, A. ( Motorola (USA) )

Levinson, H.J. ( Advanced Micro Devices, Inc. (USA) )

Litt, L.C. ( Motorola (USA) )

Mulder, M. ( ASML (Netherlands) )

Seltman, R. ( Advanced Micro Devices, Inc. (USA) )

van Praagh, J. ( ASML (Netherlands) )

さらに 5 件

掲載資料名:

Optical Microlithography XV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4691

発行年:

2002

巻:

Part One

開始ページ:

44

終了ページ:

56

総ページ数:

13

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

言語:

英語

請求記号:

P63600/4691

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012525
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2002 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.05-2002.03.08

類似資料:

1 国際会議録 Evaluation and characterization of flare in ArF lithography Litt, L.C., Bourov, A., La Fontaine, B., Apelgren, E.M. SPIE-The International Society for Optical Engineering	7 国際会議録 KrF lithography for 130 nm Finders,J., Schoot,J.B.van, Vanoppen,P., Dusa,M.V., Socha,R.J., Vandenberghe,G., Ronse,K. SPIE - The International Society for Optical Engineering
2 国際会議録 Analysis of focus errors in lithography using phase-shift monitors La Fontaine, B., Dusa, M.V., Krist, J., Acheta, A., Kye, J., Levinson, H.J., Luijten, C., Sager, C.B., Thomas, J., van … SPIE-The International Society for Optical Engineering	8 国際会議録 Evaluating the performance of a 193-nm hyper-NA immersion scanner using scatterometry O. Kritsun, B. L. Fontaine, R. Sandberg, A. Acheta, H. J. Levinson, K. Lensing, M. Dusa, J. Hauschild, A. Pici, C. … SPIE - The International Society of Optical Engineering
3 国際会議録 Influence of antireflection coatings in ArF lithography La Fontaine, B.M., Pawloski, A.R., Acheta, A., Deng, Y., Levinson, H.J., Spence, C., Chovino, C., Dieu, L., Johnstone, … SPIE - The International Society of Optical Engineering	9 国際会議録 Characterization of line-edge roughness in photoresist using an image fading technique Pawloski, A.R., Acheta, A., Lalovic, I., Fontaine, B.M.L., Levinson, H.J. SPIE - The International Society of Optical Engineering
4 国際会議録 Study of the influence of substrate topography on the focusing performance of advanced lithography scanners Fontaine, B.M.L., Hauschild, J., Dusa, M.V., Acheta, A., Apelgren, E.M., Boonman, M., Krist, J., Khathuria, A., … SPIE-The International Society for Optical Engineering	10 国際会議録 Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination Petersen, J.S., Conley, W., Roman, B.J., Litt, L.C., Lucas, K., Wu, W., Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., … SPIE-The International Society for Optical Engineering
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6 国際会議録 Evaluating a scatterometry-based focus monitor technique for hyper-NA lithography C. S. Saravanan, S. Nirmalgandhi, O. Kritsun, A. Acheta, R. Sandberg, B. L. Fontaine, H. J. Levinson, K. Lensing, M. … SPIE - The International Society of Optical Engineering	12 国際会議録 Linewidth asymmetry study to predict aberration in lithographic lenses Kye,J., Dusa,M.V., Levinson,H.J. SPIE-The International Society for Optical Engineering

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