Fullerene incorporation in DNQ Novolak photoresist for increasing plasma etch resistance

Fullerene incorporation in DNQ Novolak photoresist for increasing plasma etch resistance

著者名:

Benson, J.D. ( U.S. Army Night Vision & Electronic Sensors Directorate )
Stoltz, A.J., Jr.
Kaleczyc, A.W.
Dinan, J.H.

掲載資料名:

Advances in Resist Technology and Processing XIX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4690

発行年:

2002

巻:

Part Two

開始ページ:

1224

終了ページ:

1227

総ページ数:

4

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444363 [0819444367]

言語:

英語

請求記号:

P63600/4690

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012524
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2002 : 19th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.04-2002.03.06

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