Calibration of ESCAP resist simulation parameters from consideration of printed CD pitch bias, CD measurement offset, and wafer thermal history

Calibration of ESCAP resist simulation parameters from consideration of printed CD pitch bias, CD measurement offset, and wafer thermal history

著者名:

Robertson, S.A. ( Shipley Co. LLC (USA) )

Kang, D.

Tye, S.D.

Hansen, S.G. ( ASML (USA) )

Fumar-Pici, A.

Chiou, T.-B. ( ASML (Taiwan) )

Byers, J.D. ( KLA-Tencor Corp. (USA) )

Mack, C.A.

Smith, M.D.

さらに 4 件

掲載資料名:

Advances in Resist Technology and Processing XIX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4690

発行年:

2002

巻:

Part Two

開始ページ:

952

終了ページ:

962

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444363 [0819444367]

言語:

英語

請求記号:

P63600/4690

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012524
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2002 : 19th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.04-2002.03.06

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