Acid mobility in chemically amplified photoresists

Acid mobility in chemically amplified photoresists

著者名:

Stewart, M.D. ( Univ. of Texas at Austin (USA) )

掲載資料名:

Advances in Resist Technology and Processing XIX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4690

発行年:

2002

巻:

Part Two

開始ページ:

943

終了ページ:

951

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444363 [0819444367]

言語:

英語

請求記号:

P63600/4690

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012524
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2002 : 19th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.04-2002.03.06

類似資料:

1 国際会議録 Mesoscale simulation of positive tone chemically amplified photoresists Schmid, G.M., Burns, S.D., Stewart, M.D., Willson, C.G. SPIE-The International Society for Optical Engineering	7 国際会議録 Simulation-based formmulation of a nonchemically amplified resist for 257-nm laser mask fabrication Rathsack,B.M., Tabery,C.E., Stachowiak,T.B., Albelo,J., Willson,C.G. SPIE - The International Society for Optical Engineering
2 国際会議録 Resolution limitations in chemically amplified photoresist systems Schmid, G.M., Stewart, M.D., Wang, C.-Y., Vogt, B.D., Prabhu, V.M., Lin, E.K., Willson, C.G. SPIE - The International Society of Optical Engineering	8 国際会議録 Diffusion-induced line-edge roughness Stewart, M.D., Schmid, G.M., Goldfarb, D.L., Angelopoulos, M., Willson, C.G. SPIE-The International Society for Optical Engineering
3 国際会議録 Study of acid transport using IR spectroscopy and SEM Stewart,M.D., Somervell,M.H., Tran,H.V., Postnikov,S.V., Willson,C.G. SPIE - The International Society for Optical Engineering	9 国際会議録 Rational design of bleachable nonchemically amplified DUV photoactive compounds Rathsack,B.M., Tattersall,P.I., Tabery,C.E., Lou,K., Stachowiak,T.B., Medeiros,D.R., Albelo,J.A., Pirogovsky,P.Y., … SPIE-The International Society for Optical Engineering
4 国際会議録 Understanding the role of base quenchers in photoresists Michaelson, T.B., jamieson, A.T., Pawloski, A.R., Byers, J.D., Acheta, A., Willson, C.G. SPIE - The International Society of Optical Engineering	10 国際会議録 Recent advances in a molecular level lithography simulation Schmid,G.M., Singh,V.K., Flanagin,L.W., Stewart,M.D., Burns,S.D., Willson,C.G. SPIE - The International Society for Optical Engineering
5 国際会議録 Characterization of a non-chemically amplified resist for photomask fabrication using a 257-nm optical pattern generator Rathsack,B.M., Tabery,C.E., Stachowiak,T.B., Dallas,T.E., Xu,C.-B., Pochkowski,M., Willson,C.G. SPIE - The International Society for Optical Engineering	11 国際会議録 Effect of humidity on deprotection kinetics in chemically amplified resists Burns, S.D., Medeiros, D.R., Johnson, H.F., Wallraff, G.M., Hinsberg, W.D., Willson, C.G. SPIE-The International Society for Optical Engineering
6 国際会議録 Mechanistic understanding of line-end shortening Stewart,M.D., Schmid,G.M., Postnikov,S.V., Willson,C.G. SPIE-The International Society for Optical Engineering	12 国際会議録 Fundamental study of photoresist dissolution with real time spectroscopic ellipsometry and interferometry Burns, S.D., Schmid, G.M., Trinque, B.C., Willson, J., Wunderlich, J., Tsiartas, P.C., Taylor, J.C., Burns, R.L., … SPIE-The International Society for Optical Engineering

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