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Insertion effects of various acid sensitive groups into acetal type polymer on the profile of 248-nm chemically amplified resist

著者名:
Chung, Y.-S. ( DongJin Semichem Co., Ltd. (Korea) )
Kim, H.-J.
Cho, S.-H.
Lee, D.-H.
Im, K.-H.
Yim, Y.-G.
Kim, D.-B.
Kim, J.-Y.
さらに 3 件
掲載資料名:
Advances in Resist Technology and Processing XIX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4690
発行年:
2002
巻:
Part Two
開始ページ:
660
終了ページ:
670
総ページ数:
11
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444363 [0819444367]
言語:
英語
請求記号:
P63600/4690
資料種別:
国際会議録

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