E-beam curing effects on the etch and CD-SEM stability of 193-nm resists | 東京工業大学附属図書館文献データベース

Blank Cover Image

E-beam curing effects on the etch and CD-SEM stability of 193-nm resists

著者名:

Padmanaban, M. ( Clariant Corp. (USA) )

Chen, W.-L. ( Lam Research Corp. (USA) )

Livesay, W.R. ( Electron Vision Corp. (USA) )

さらに 8 件

掲載資料名:

Advances in Resist Technology and Processing XIX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4690

発行年:

2002

巻:

Part One

開始ページ:

606

終了ページ:

614

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444363 [0819444367]

言語:

英語

請求記号:

P63600/4690

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012523
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2002 : 19th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.04-2002.03.06

類似資料:

1 国際会議録 CD changes of 193-nm resists during SEM measurement Kudo,T., Bae,J.-B., Dammel,R.R., Kim,W.-K., McKenzie,D.S., Rahman,M.D., Padmanaban,M., Ng,W. SPIE-The International Society for Optical Engineering	7 国際会議録 Application of photodecomposable base concept to 193-nm resists Padmanaban,M., Bae,J.-B., Cook,M.M., Kim,W.-K., Klauck-Jacobs,A., Kudo,T., Rahman,M.D., Dammel,R.R., Byers,J.D. SPIE - The International Society for Optical Engineering
2 国際会議録 High-performance 193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate Rahman, M.D., Alemy, E., Conley, W., Miller, D., Dammel, R.R., Kim, W.-K., Kudo, T., Lee, S.-H., Masuda, S., McKenzie, … SPIE-The International Society for Optical Engineering	8 国際会議録 PEB sensitivity studies of ArF resist Lee, S.H., Kim, W.-K., Rahman, D.M., Kudo, T., Timko, A., Anyadiegwu, C., McKenzie, D.S., Kanda, T., Dammel, R.R., … SPIE-The International Society for Optical Engineering
3 国際会議録 Performance of imide and methide onium PAGs in 193-nm resist formulations Padmanaban, M., Dammel, R.R., Lee, S.H., Kim, W.-K., Kudo, T., McKenzie, D.S., Rahman, D. SPIE-The International Society for Optical Engineering	9 国際会議録 Cycloolefin-maleic anhydride copolymers for 193-nm resist compositions Rahman,M.D., Bae,J.-B., Cook,M.M., Durham,D.L., Kudo,T., Kim,W.-K., Padmanaban,M., Dammel,R.R. SPIE - The International Society for Optical Engineering
4 国際会議録 Novel hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate for 193-nm resist compositions Rahman,M.D., McKenzie,D.S., Bae,J.-B., Kudo,T., Kim,W.-K., Padmanaban,M., Dammel,R.R. SPIE-The International Society for Optical Engineering	10 国際会議録 Versatility in lithographic performance of advanced 193 nm contact hole resist [6153-86] Kudo, T., Lin, G., Lee, D., Rahman, D., Timko, A., Mckenzie, D., Anyadiegwu, C., Chiu, S., Houlihan, F., Rentkiewicz, … SPIE - The International Society of Optical Engineering
5 国際会議録 Illumination, acid diffusion, and process optimization considerations for 193-nm contact hole resists Kudo, T., Alemy, E.L., Dammel, R.R., Kim, W.-K., Lee, S.-H., Masuda, S., McKenzie, D.S., Rahman, M.D., Romano, A.R., … SPIE-The International Society for Optical Engineering	11 国際会議録 193 nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate [6153-14] Rahman, M D, Chakrapani, S, Anyadiegwu, C, Lin, G, Timko, A, Houlihan, F, Rentkiewicz, D, Kudo, T, McKenzie, D, Dammel, … SPIE - The International Society of Optical Engineering
6 国際会議録 193-nm CD shrinkage under SEM: modeling the mechanism Habermas, A., Hong, D., Ross, M.F., Livesay, W.R. SPIE-The International Society for Optical Engineering	12 国際会議録 PEB sensitivity studies of ArF resists: II. Polymer and solvent effects Hong, C.-S., Lee, S.-H., Kim, W.-K., Kudo, T., Timko, A., Mckenzie, D., Anyadiegwu, C., Rahman, D.M., Lin, G., Dammel, … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12