Contact hole patterning performance of ArF resist for 0.10μm technology node
- 著者名:
Kim, J.-S. ( Hynix Semiconductor, Inc. (Korea) ) Jung, J.-C. Kong, K.-K. Lee, G.-S. Lee, S.-K. Hwang, Y.-S. Shin, K.-S. - 掲載資料名:
- Advances in Resist Technology and Processing XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4690
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 577
- 終了ページ:
- 585
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- 言語:
- 英語
- 請求記号:
- P63600/4690
- 資料種別:
- 国際会議録
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