Applicaton of blends and side chain Si-O copolymers as high-etch resistant sub-100-nm E-beam resists

Applicaton of blends and side chain Si-O copolymers as high-etch resistant sub-100-nm E-beam resists

著者名:

Huang, W.-S. ( IBM Microelectronics Div. (USA) )

Kwong, R.W.

Moreau, W.M.

Lang, R.

Medeiros, D.R. ( IBM Thomas J. Watson Research Ctr. (USA) )

Dai, J. ( Cornell Univ. (USA) )

Ober, C.K.

さらに 6 件

掲載資料名:

Advances in Resist Technology and Processing XIX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4690

発行年:

2002

巻:

Part One

開始ページ:

432

終了ページ:

441

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444363 [0819444367]

言語:

英語

請求記号:

P63600/4690

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012523
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2002 : 19th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.04-2002.03.06

類似資料:

1 国際会議録 High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask making Huang,W.-S., Kwong,R.W., Moreau,W.M., Lang,R., Robinson,C.F., Medeiros,D.R., Petrillo,K.E., Aviram,A., Mahorowala,A.P., … SPIE-The International Society for Optical Engineering	7 国際会議録 Impact of thin resist processes on post-etch LER Mahorowala, A.P., Goldfarb, D.L., Temple, K., Petrillo, K.E., Pfeiffer, D., Babich, K., Angelopoulos, M., Gallatin, … SPIE-The International Society for Optical Engineering
2 国際会議録 High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask and device making Huang,W.-S., Kwong,R.W., Moreau,W.M., Lang,R., Robinson,C.F., Medeiros,D.R., Petrillo,K.E., Aviram,A., Mahorowala,A.P., … SPIE-The International Society for Optical Engineering	8 国際会議録 Sensitivity factors of CAR electron-beam resists Medeiros, D.R., Petrillo, K.E., Breyta, G., Huang, W.-S., Moreau, W.M. SPIE-The International Society for Optical Engineering
3 国際会議録 Current developments of a high-performance CA resist for mask-making application Huang, W.-S., He, W., Li, W., Moreau, W.M., Lang, R., Medeiros, D.R., Petrillo, K.E., Mahorowala, A.P., Angelopoulos, … SPIE-The International Society for Optical Engineering	9 国際会議録 Use of KRS-XE positive chemically amplified resist for optical mask manufacturing Ashe,B., Deverich,C., Rabidoux,P.A., Peck,B., Petrillo,K.E., Angelopoulos,M., Huang,W.-S., Moreau,W.M., Medeiros,D.R. SPIE-The International Society for Optical Engineering
4 国際会議録 Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond Pfeiffer, D., Mahorowala, A.P., Babich, K., Medeiros, D.R., Petrillo, K.E., Angelopoulos, M., Huang, W.-S., Halle, S., … SPIE-The International Society for Optical Engineering	10 国際会議録 High-resolution patterning in chemically amplified resists: the effect of film thickness Medeiros,D.R., Moreau,W.M., Petrillo,K.E., Chauhan,M., Huang,W.-S., Magg,C., Goldfarb,D., Angelopoulos,M., Nealey,P.F. SPIE-The International Society for Optical Engineering
5 国際会議録 Extending the performance of KRS-XE for high-throughput electron-beam lithography for advanced mask making Medeiros,D.R., Petrillo,K.E., Bucchignano,J., Angelopoulos,M., Huang,W.-S., Li,W., Moreau,W.M., Lang,R., Kwong,R.W., … SPIE-The International Society for Optical Engineering	11 国際会議録 Enhancement of KRS-XE for 50-keV advanced mask-making applications Petrillo, K.E., Medeiros, D.R., Buccohignano, J., Angelopoulos, M., Goldfarb, D.L., Huang, W.-S., Moreau, W.M., Lang, … SPIE-The International Society for Optical Engineering
6 国際会議録 High-contrast positive resists for e-beam mask making Huang,W.-S., Kwong,R.W., Moreau,W.M., Angelopoulos,M., Bucchiagnano,J., Petrillo,K.E., Ito,H. SPIE - The International Society for Optical Engineering	12 国際会議録 Hardmask technology for sub-100 nm lithographic imaging Babich, K., Mahorowala, A.P., Medeiros, D.R., Pfeiffer, D., Petrillo, K.E., Angelopoulos, M., Grill, A., Patel, V., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12