Evolution of a 193-nm bilayer resist for manufacturing
- 著者名:
Kwong, R.W. ( IBM Microelectronics Div. (USA) ) Khojasteh, M. Lawson, P. Hughes, T. Varanasi, P.R. Brunsvold, B. Allen, R.D. ( IBM Almaden Research Ctr. (USA) ) Brock, P.J. Sooriyakumaran, R. Truong, H.D. Mahorowala, A.P. ( IBM Thomas J. Watson Research Ctr. (USA) ) Medeiros, D.R. - 掲載資料名:
- Advances in Resist Technology and Processing XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4690
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 403
- 終了ページ:
- 409
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- 言語:
- 英語
- 請求記号:
- P63600/4690
- 資料種別:
- 国際会議録
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8
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Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond
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