Mesoscale simulation of positive tone chemically amplified photoresists

Mesoscale simulation of positive tone chemically amplified photoresists

著者名:

Schmid, G.M. ( Univ. of Texas at Austin (USA) )
Burns, S.D.
Stewart, M.D.
Willson, C.G.

掲載資料名:

Advances in Resist Technology and Processing XIX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4690

発行年:

2002

巻:

Part One

開始ページ:

381

終了ページ:

390

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444363 [0819444367]

言語:

英語

請求記号:

P63600/4690

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012523
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2002 : 19th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.04-2002.03.06

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2 国際会議録 Resolution limitations in chemically amplified photoresist systems Schmid, G.M., Stewart, M.D., Wang, C.-Y., Vogt, B.D., Prabhu, V.M., Lin, E.K., Willson, C.G. SPIE - The International Society of Optical Engineering	8 国際会議録 Positive- and negative-tone water-processable photoresists: a progress report Yamada,S., Medeiros,D.R., Patterson,K., Jen,W.-L.K., Rager,T., Lin,Q., Lenci,C., Byers,J.D., Havard,J.M., Pasini,D., … SPIE-The International Society for Optical Engineering
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6 国際会議録 Mesoscale modeling for SFIL simulating polymerization kinetics and densification Burns, R.L., Johnson, S.C., Schmid, G.M., Kim, E.K., Dickey, M.D., Meiring, J., Burns, S.D., Stacey, N.A., Willson, … SPIE - The International Society of Optical Engineering	12 国際会議録 Design of a positive-tone water-soluble resist Havard,J.M., Frechet,J.M.J., Pasini,D., Mar,B., Yamada,S., Medeiros,D.R., Willson,C.G. SPIE-The International Society for Optical Engineering

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