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Measurement of the spatial evolution of the deprotection reaction front with nanometer resolution using neutron reflectometry

著者名:
Lin, E.K. ( National Institute of Standards and Technology (USA) )
Soles, C.L.
Goldfarb, D.L. ( IBM Thomas J. Watson Research Ctr. (USA) )
Trinque, B.C. ( Univ. of Texas at Austin (USA) )
Burns, S.D.
Jones, R.L. ( National Institute of Standards and Technology (USA) )
Lenhart, J.L.
Angelopoulos, M. ( IBM Thomas J. Watson Research Ctr. (USA) )
Willson, C.G. ( Univ. of Texas at Austin (USA) )
Satija, S.K. ( National Institute of Standards and Technology (USA) )
Wu, W.-L.
さらに 6 件
掲載資料名:
Advances in Resist Technology and Processing XIX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4690
発行年:
2002
巻:
Part One
開始ページ:
313
終了ページ:
320
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444363 [0819444367]
言語:
英語
請求記号:
P63600/4690
資料種別:
国際会議録

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1 国際会議録 Deprotection volume characteristics and line-edge morphology in chemcially amplified resists

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7 国際会議録 Characterization of thin and ultrathin polymer and resist films

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3 国際会議録 X-ray absorption spectroscopy to probe interfacial issues in photolithography

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11 国際会議録 Utilizing Near Edge X-ray Absorption Fine Structure to Probe Interfacial Issues in Photolithography

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