Amine gradient process for 157-nm lithography

Amine gradient process for 157-nm lithography

著者名:

Jung, J.-C. ( Hynix Semiconductor, Inc. (Korea) )

掲載資料名:

Advances in Resist Technology and Processing XIX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4690

発行年:

2002

巻:

Part One

開始ページ:

212

終了ページ:

220

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444363 [0819444367]

言語:

英語

請求記号:

P63600/4690

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012523
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2002 : 19th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.04-2002.03.06

類似資料:

1 国際会議録 100-nm device fabrication using ArF resist Lee, S.-K., Jung, J.-C., Hwang, Y.-S., Park, K.-D., Kim, J.-S., Kong, K.-K., Shin, K.-S. SPIE-The International Society for Optical Engineering	7 国際会議録 Organosiloxane based bottom antireflective coatings for 193nm lithography Son, E.-K., Kim, J.-W., Lee, S.-H., Park, C.-S., Lee, J.-W., Kim, J., Lee, G.-S., Lee, S.-K., Ban, K.-D., Jung, J.-C., … SPIE - The International Society of Optical Engineering
2 国際会議録 Characterization and improvement of resist pattern collapse on ArF (193 nm) organic B.A.R.C. Hwang, Y.-S., Jung, J.-C., Park, K.-D., Lee, S.-K., Kim, J.-S., Kong, K.-K., Shin, K.-S., Ding, S.-J., Xiang, Z., … SPIE-The International Society for Optical Engineering	8 国際会議録 Advances in TFE-based fluoropolymers for 157-nm lithography: a progress report Sharif, I., DesMarteau, D., Ford, L., Shafer, G.J., Thomas, B., Conley, W., Zimmerman, P., Miller, D., Lee, G.S., … SPIE-The International Society for Optical Engineering
3 国際会議録 Novel high-performance ArF resist for sub-100-nm lithography Lee,G., Koh,C.-W., Jung,J.-C., Jung,M.-H., Kong,K.-K., Kim,J.-S., Shin,K.-S., Choi,S.-J., Kim,Y.-S., Choi,Y.-J., … SPIE-The International Society for Optical Engineering	9 国際会議録 25 nm immersion lithography at 193 nm wavelength Choi, S.-H., Park, T.-H., Kim, E., Youn, H.-J., Lee, D.-Y., Ban, Y.-C., Je, A.-Y., Kim, D.-H., Hong, J.-S., Kim, Y.-H., … SPIE - The International Society of Optical Engineering
4 国際会議録 Synthesis of fluorinated materials for 193-nm immersion lithography and 157-nm lithography Lee, C. H., Han, S., Park, K. S., Kang, H. Y., Oh, H. W., Lee, J. E., Kim, K. M., Kim, Y. H., Kim, T. S., Oh, H.-K. SPIE - The International Society of Optical Engineering	10 国際会議録 New approach for 193-nm resist using modified cycloolefin resin Park, J.H., Seo, D.C., Kim, C.-M., Lim, Y.-T., Cho, S.-D., Lee, J.B., Joo,H.-S., Jeon, H.-P., Kim, S.-J., Jung, J.-C., … SPIE-The International Society for Optical Engineering
5 国際会議録 "Novel chemically amplified positive resist containing acetal-type crosslinker of poly(3,3'-dimethoxypropene) for 193-nm top surface imaging process" Koh,C.-W., Jung,J.-C., Kim,M.-S., Kong,K.-K., Lee,G., Jung,M.-H., Kim,J.-S., Shin,K.-S. SPIE-The International Society for Optical Engineering	11 国際会議録 Advanced module-based approach to effective CD prediction of sub-100nm patterns Shin, J., Kim, I., Hwang, C., Park, D.-W., Woo, S.-G., Cho, H.-K., Han, W.-S., Moon, J.-T. SPIE - The International Society of Optical Engineering
6 国際会議録 Contact hole patterning performance of ArF resist for 0.10μm technology node Kim, J.-S., Jung, J.-C., Kong, K.-K., Lee, G.-S., Lee, S.-K., Hwang, Y.-S., Shin, K.-S. SPIE-The International Society for Optical Engineering	12 国際会議録 Feasibility study of printing sub-100-nm with ArF lithography Kim,S.-K., Hong,J.-G., Park,J.-O., Yoo,T.-J., Hyun,Y.-S., Bok,C.-K., Shin,K.-S. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12