Fluoropolymer resists for 157-nm lithography
- 著者名:
Toriumi, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Shida, N. Watanabe, H. Yamazaki, T. Ishikawa, S. Itani, T. - 掲載資料名:
- Advances in Resist Technology and Processing XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4690
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 191
- 終了ページ:
- 199
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- 言語:
- 英語
- 請求記号:
- P63600/4690
- 資料種別:
- 国際会議録
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Development and characterization of new 157-nm photoresists based on advanced fluorinated polymers
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The dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials
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