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New approach for 193-nm resist using modified cycloolefin resin

著者名:
Park, J.H. ( Korea Kumho Petrochemical Co., Ltd. (Korea) )
Seo, D.C.
Kim, C.-M.
Lim, Y.-T.
Cho, S.-D.
Lee, J.B.
Joo,H.-S.
Jeon, H.-P.
Kim, S.-J.
Jung, J.-C. ( Hynix Semiconductor, Inc. (Korea) )
Shin, K.-S.
Kong, K.K.
Yamada, T. ( Nagase ChemteX Corp. (Japan) )
さらに 8 件
掲載資料名:
Advances in Resist Technology and Processing XIX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4690
発行年:
2002
巻:
Part One
開始ページ:
120
終了ページ:
126
総ページ数:
7
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444363 [0819444367]
言語:
英語
請求記号:
P63600/4690
資料種別:
国際会議録

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1 国際会議録 Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology

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