Negative photoresist for 157-nm microlithography: a progress report
- 著者名:
Conley, W. ( International SEMATECH (USA) ) Trinque, B.C. ( Univ. of Texas at Austin (USA) ) Miller, D.A. ( International SEMATECH (USA) ) Zimmerman, P. Kudo, T. ( Clariant Corp. (USA) ) Dammel, R.R. Romano, A.R. Willson, C.G. ( Univ. of Texas at Austin (USA) ) - 掲載資料名:
- Advances in Resist Technology and Processing XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4690
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 94
- 終了ページ:
- 100
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- 言語:
- 英語
- 請求記号:
- P63600/4690
- 資料種別:
- 国際会議録
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SPIE-The International Society for Optical Engineering |
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SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |