Compensation of resist trim process and polygate plasma microloading effect for lithography process window and CD uniformity improvement

Compensation of resist trim process and polygate plasma microloading effect for lithography process window and CD uniformity improvement

著者名:

Lee, K.M. ( United Microelectronics Corp. (Taiwan) )
Fan, C.W.
Hwang, J.R.
Liu, C.C.
Hung, K.C.

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography XVI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4689

発行年:

2002

巻:

Part Two

開始ページ:

1007

終了ページ:

1016

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444356 [0819444359]

言語:

英語

請求記号:

P63600/4689

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012522
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, inspection, and process control for microlithography
回次:	2002 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.04-2002.03.07

類似資料:

1 国際会議録 Polygate within wafer CD uniformity improvement by the minimization of lens heating effect Chang,Y.S., Wu,M.J., Hung,M.Y., Cheng,K.Y., Hsieh,J.C. SPIE-The International Society for Optical Engineering	7 国際会議録 Pecision control of poly-gate CD by local OPC for elimination of microloading effect on 0.13-Цm CMOS technology Lee, T.-K., Wang, Y.-C., Chi, M.-H., Lu, C.Y., Hsieh, C.H., Liu, R.G., Liao, H.J., Yang, S.S., Chang, C.-H. SPIE-The International Society for Optical Engineering
2 国際会議録 Global CD uniformity improvement in mask manufacturing for advanced lithography Chang, S.-M., Chin, C.C., Wang, W.-C., Lu, C.-L., Hsieh, R.-G., Tsay, C.-S., Yen, Y.-S., Chin, S.-C., Lee, H.-C., Liu, … SPIE - The International Society of Optical Engineering	8 国際会議録 Lens FPD and LH effect on CD control of lithography process Huang,D.F., Hung,C.-C. SPIE - The International Society for Optical Engineering
3 国際会議録 Characterization of resist flow process for the improvement of contact hole CD uniformity Koh, C.-W., Lee, D.-H., Kim, M.-S., Park, S.-N., Kwon, W.-T. SPIE-The International Society for Optical Engineering	9 国際会議録 Develop process optimization for CD uniformity improvement Shin,J.-C., Won,J.-I., Jung,H.-Y., Kim,M.-S., Choi,Y.-K., Han,O. SPIE-The International Society for Optical Engineering
4 国際会議録 Quantification of CD-SEM wafer global charging effect on CD and CD uniformity of 193-nm lithography Ke, C.-M., Hung, H.-L., Chang, A., Chen, J.-H., Gau, T.-S., Ku, Y.-C., Lin, B.J., Otaka, T., Ueda, K., Kawada, H., … SPIE - The International Society of Optical Engineering	10 テクニカルペーパー CHARACTERISTICS AND PERFORMANCE OF THE VARIABLE POLARITY PLASMA ARC WELDING PROCESS USED IN THE SPACE SHUTTLE EXTERNAL TANK Hung, R.J., Lee, C.C., Liu, J.W. National Aeronautics and Space Adminstration
5 国際会議録 Precision control of poly-gate CD by local OPC for elimination of microloading effect on 0.13-μm CMOS technology Lee, T.-K., Wang, Y.-C., Chi, M., Lu, C.Y., Hsieh, C.H., Liu, R.G., Liao, H.J., Yang, S.S., Chang, C.-H. SPIE-The International Society for Optical Engineering	11 国際会議録 Improvement of resist profile roughness in bilayer resist process Jeong,C.-Y., Ryu,S., Park,K.-Y., Lee,W.G., Lee,S.-W., Lee,D.-H. SPIE - The International Society for Optical Engineering
6 国際会議録 Precision control of poly-gate CD by local OPC for elimination of microloading effect on 0.13-μm CMOS technology Lee, T.-K., Wang, Y.-C., Chi, M.-H., Lu, C.Y., Hsieh, C.H., Liu, R.G., Liao, H.J., Yang, S.S., Chang, C.-H. SPIE-The International Society for Optical Engineering	12 国際会議録 Global CD uniformity improvement using dose modulation and pattern correction of pattern density-dependent and position-dependent errors Chen, C.-J., Lee, H.-C., Yeh, L.-C., Liu, K.-C., Lien, T.-C., Chuo, Y.-C., Hsieh, H.-C., Lin, B.J. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12