Impact on OPC treatment accuracy due to illumination pupil shape deviation for 110-nm target CD
- 著者名:
Roy, S. ( ASML MaskTools, Inc. (USA) ) Schlief, R.E. Hsu, S. Shi, X. Liebchen, A. Chen, J.F. Hansen, S.G. ( ASML (USA) ) - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4689
- 発行年:
- 2002
- 巻:
- Part Two
- 開始ページ:
- 876
- 終了ページ:
- 883
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444356 [0819444359]
- 言語:
- 英語
- 請求記号:
- P63600/4689
- 資料種別:
- 国際会議録
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2
国際会議録
Impact of measured pupil illumination fill distribution on lithography simulation and OPC models
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The application of critical shape metrology toward CD-SEM measurement accuracy on sub-60nm features
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