Characterization of interfacial layers and surface roughness using spectroscopic reflectance, spectroscopic ellipsometry, and atomic force microscopy

Characterization of interfacial layers and surface roughness using spectroscopic reflectance, spectroscopic ellipsometry, and atomic force microscopy

著者名:

Hoobler, R.J. ( Nanometrics Inc. (USA) )
Korlahalli, R.
Boltich, E.
Serafin, J. ( Univ. of South Alabama (USA) )

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography XVI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4689

発行年:

2002

巻:

Part Two

開始ページ:

756

終了ページ:

764

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444356 [0819444359]

言語:

英語

請求記号:

P63600/4689

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012522
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, inspection, and process control for microlithography
回次:	2002 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.04-2002.03.07

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