CD metrology for avoiding shrinkage of ArF resist patterns in 100-nm ArF lithography
- 著者名:
- You, T.-J. ( Hynix Semiconductor Inc. (Korea) )
- Bok, C.-K.
- Shin, K.-S.
- 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4689
- 発行年:
- 2002
- 巻:
- Part Two
- 開始ページ:
- 724
- 終了ページ:
- 732
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444356 [0819444359]
- 言語:
- 英語
- 請求記号:
- P63600/4689
- 資料種別:
- 国際会議録
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SPIE-The International Society for Optical Engineering |
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SPIE-The International Society for Optical Engineering |