Structural characterizaton of deep-submicron lithographic structures using small-angle nentron scattering
- 著者名:
Lin, E.K. ( National Institute of Standards and Technology (USA) ) Jones, R.L. Wu, W.-L. Barker, J.G. Bolton, P.J. ( Shipley Co. Inc. (USA) ) Barclay, G.G. - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4689
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 541
- 終了ページ:
- 548
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444356 [0819444359]
- 言語:
- 英語
- 請求記号:
- P63600/4689
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Materials Research Society | |
Materials Research Society |
10
国際会議録
SMALL ANGLE NEUTRON SCATTERING FROM NANOCRYSTALLINE Pd AND Cu COMPACTED AT ELEVATED TEMPERATURES
MRS - Materials Research Society |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |