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Overlay metrology results on leading-edge Cu processes

著者名:
Vachellerie, V. ( STMicroelectronics (France) )
Ristoiu, D.
Deleporte, A.G.
Sassoulas, P.-O.
Spinelli, P.
Poulingue, M. ( Schlumberger Semiconductor Solutions Europe (France) )
Fabre, P.
Arendt, R. ( Schlumberger Semiconductor Solutions Europe (Germany) )
Sundaram, G. ( Schlumberger Semiconductor Solutions (USA) )
Knutrud, P.C.
さらに 5 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XVI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4689
発行年:
2002
巻:
Part One
開始ページ:
223
終了ページ:
236
総ページ数:
14
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444356 [0819444359]
言語:
英語
請求記号:
P63600/4689
資料種別:
国際会議録

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