Benchmarking of advanced CD-SEMs at the 130-nm CMOS technology node

Benchmarking of advanced CD-SEMs at the 130-nm CMOS technology node

著者名:

Bunday, B.D. ( International SEMATECH (USA) )
Bishop, M.

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography XVI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4689

発行年:

2002

巻:

Part One

開始ページ:

102

終了ページ:

115

総ページ数:

14

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444356 [0819444359]

言語:

英語

請求記号:

P63600/4689

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012521
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, inspection, and process control for microlithography
回次:	2002 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.04-2002.03.07

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1 国際会議録 Results of benchmarking of advanced CD-SEMs at the 90-nm CMOS technology node Bunday, B.D., Bishop, M., Allgair, J.A. SPIE - The International Society of Optical Engineering	7 国際会議録 Quantitative profile-shape measurement study on a CD-SEM with application to etch-bias control Bunday, B.D., Bishop, M., Bennett, M.H., Swyers, J.R., Haberman-Golan, Z. SPIE-The International Society for Optical Engineering
2 国際会議録 Specifications and methodologies for benchmarking of advanced CD-SEMs at the 90-nm CMOS technology node and beyond Bunday, B.D., Bishop, M. SPIE-The International Society for Optical Engineering	8 国際会議録 Determination of optimal parameters for CD-SEM measurement of line-edge roughness Bunday, B.D., Bishop, M., McCormack, D.W., Jr., Villarrubia, J.S., Vladar, A.E., Dixson, R., Vorburger, T.V., Orji, … SPIE - The International Society of Optical Engineering
3 国際会議録 Benchmarking of current generation overlay systems at the 130-nm technology node Russo, B., Bishop, M. SPIE-The International Society for Optical Engineering	9 国際会議録 Use of fast Fourier transform methods in maintaining stability of production CD-SEMs Bunday,B.D., Davidson,M.P. SPIE - The International Society for Optical Engineering
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5 国際会議録 CD-SEM measurement line-edge roughness test patterns for 193-nm lithography Bunday, B.D., Bishop, M., Villarrubia, J.S., Vladar, A.E. SPIE-The International Society for Optical Engineering	11 国際会議録 Dimensional metrology of resist lines using a SEM model-based library approach Villarrubia, J.S., Vladar, A.E., Bunday, B.D., Bishop, M. SPIE - The International Society of Optical Engineering
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