Manufacturing sub-50-nm gratings using E-beam lithography and electroplating
- 著者名:
- Kroon, M. ( Philips Research Labs. (Netherlands) )
- van Delft, F.C.M.J.M.
- Ketelaars, W.S.M.M.
- 掲載資料名:
- Emerging Lithographic Technologies VI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4688
- 発行年:
- 2002
- 巻:
- Part Two
- 開始ページ:
- 922
- 終了ページ:
- 931
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444349 [0819444340]
- 言語:
- 英語
- 請求記号:
- P63600/4688
- 資料種別:
- 国際会議録
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