Defect printability analysis on electron projection lithography with diamond stencil reticle

Defect printability analysis on electron projection lithography with diamond stencil reticle

著者名:

Tomo, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Kojima, Y. ( Fujitsu Ltd. (Japan) )

Shimizu, S. ( Nikon Corp. (Japan) )

Watanabe, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

掲載資料名:

Emerging Lithographic Technologies VI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4688

発行年:

2002

巻:

Part Two

開始ページ:

786

終了ページ:

797

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444349 [0819444340]

言語:

英語

請求記号:

P63600/4688

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012520
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging lithographic technologies
回次:	2002 : 6th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.05-2002.03.07

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2 国際会議録 Dynamic image placement accuracy of a stencil mask Takenaka, H., Yamashita, H., Takahashi, K., Tomo, Y., Watanabe, M., Iwasaki, T., Yamamoto, J., Yamabe, M. SPIE-The International Society for Optical Engineering	8 国際会議録 Design rule of hole-layer for electron projection lithography Koike, K., Sakaue, H., Takenaka, H., Koba, F., Tsuchida, T., Yamabe, M. SPIE - The International Society of Optical Engineering
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