Lossless compression techniques for maskless lithography data
- 著者名:
- Dai, V. ( Univ. of California/Berekeley (USA) )
- Zakhor, A.
- 掲載資料名:
- Emerging Lithographic Technologies VI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4688
- 発行年:
- 2002
- 巻:
- Part Two
- 開始ページ:
- 583
- 終了ページ:
- 594
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444349 [0819444340]
- 言語:
- 英語
- 請求記号:
- P63600/4688
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
国際会議録
Reduced complexity compression algorithms for direct-write maskless lithography systems [6151-84]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
国際会議録
Complexity reduction for C4 compression for implementation in maskless lithography datapath
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |