Novel design of att-PSM structure for extreme-ultraviolet lithography and enhancement of image contrast during inspection

Novel design of att-PSM structure for extreme-ultraviolet lithography and enhancement of image contrast during inspection

著者名:

Han, S.-I. ( Motorola (USA) )

掲載資料名:

Emerging Lithographic Technologies VI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4688

発行年:

2002

巻:

Part One

開始ページ:

481

終了ページ:

494

総ページ数:

14

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444349 [0819444340]

言語:

英語

請求記号:

P63600/4688

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012519
シリーズID:	PA00000029
会議名:	Emerging lithographic technologies
回次:	2002 : 6th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.05-2002.03.07

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