Low-temperature wafer-scale warm embossing for mix and match with UV lithography

Low-temperature wafer-scale warm embossing for mix and match with UV lithography

著者名:

Schulz, H. ( Univ. of Wuppertal (Germany) )

Wissen, M.

Roos, N.

Scheer, H.-C.

Pfeiffer, K. ( micro resist technology GmbH (Germany) )

Gruetzner, G.

さらに 1 件

掲載資料名:

Emerging Lithographic Technologies VI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4688

発行年:

2002

巻:

Part One

開始ページ:

223

終了ページ:

231

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444349 [0819444340]

言語:

英語

請求記号:

P63600/4688

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012519
シリーズID:	PA00000029
会議名:	Emerging lithographic technologies
回次:	2002 : 6th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.05-2002.03.07

類似資料:

1 国際会議録 Mix and match of nanoimprint and UV lithography Reuther,F., Pfeiffer,K., Fink,M., Gruetzner,G., Schulz,H., Scheer,H.-C., Gaboriau,F., Cardinaud,C. SPIE-The International Society for Optical Engineering	7 国際会議録 Nanostructuring of polymers by hot embossing lithography Scheer, H.-C., Glinsner, T., Wissen, M., Pelzer, R. SPIE - The International Society of Optical Engineering
2 国際会議録 Performance of 4-in. wafer-scale thermoset working stamps in hot-embossing lithography Roos, N., Schulz, H., Fink, M., Pfeiffer, K., Osenberg, F., Scheer, H.-C. SPIE-The International Society for Optical Engineering	8 国際会議録 Strategies for hybrid techniques of UV lithography and thermal nanoimprint M. Wissen, N. Bogdanski, S. Moellenbeck, H.-C. Scheer Society of Photo-optical Instrumentation Engineers
3 国際会議録 Dynamic mask defects in hot embossing lithography Bogdanski, N., Schulz, H., Wissen, M., Scheer, H. -C. SPIE - The International Society of Optical Engineering	9 国際会議録 Silanized polymeric working stamps for hot embossing lithography Wissen, M., Bogdanski, N., Jerzy, R., Berrada, Z.E., Fink, M., Reuther, F., Glinsner, T., Scheer, H.-C. SPIE - The International Society of Optical Engineering
4 国際会議録 Nanoimprint lithography with a commercial 4-in. bond system for hot embossing Roos,N., Luxbacher,T., Glinsner,T., Pfeiffer,K., Schulz,H., Scheer,H.-C. SPIE-The International Society for Optical Engineering	10 国際会議録 Fabrication of a 3D nano-imprint template with a conformal dry vapor deposited electron beam resist Wissen, M., Glinsner, T., Bogdanski, N., Scheer, H.-C., Gruetzner, G. SPIE - The International Society of Optical Engineering
5 国際会議録 Impact of vacuum environment on the hot embossing process Roos, N., Wissen, M., Glinsner, T., Scheer, H.-C. SPIE-The International Society for Optical Engineering	11 国際会議録 Pattern-induced non-uniformity of residual layers in nanoimprint lithography Bogdanski, N., Wissen, M., Scheer, H.-C. SPIE - The International Society of Optical Engineering
6 国際会議録 Strategies for wafer-scale hot embossing lithography Scheer,H.-C., Schulz,H., Lyebyedyev,D. SPIE-The International Society for Optical Engineering	12 国際会議録 Reactive polymers: a route to nanoimprint lithography at low temperatures Pfeiffer, K., Reuther, F., Carlberg, P., Fink, M., Gruetzner, G., Montelius, L. SPIE-The International Society for Optical Engineering

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