High-resolution templates for step and flash imprint lithography
- 著者名:
Resnick, D.J. ( Motorola (USA) ) Dauksher, W.J. Mancini, D.P. Nordquist, K.J. Ainley, E.S. Gehoski, K.A. Baker, J.H. Bailey, T.C. ( Univ. of Texas at Austin (USA) ) Choi, B.J. Johnson, S. Sreenivasan, S.V. Ekerdt, J.G. Willson, C.G. - 掲載資料名:
- Emerging Lithographic Technologies VI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4688
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 205
- 終了ページ:
- 213
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444349 [0819444340]
- 言語:
- 英語
- 請求記号:
- P63600/4688
- 資料種別:
- 国際会議録
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Critical dimension and image placement issues for step and flash imprint lithography templates
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Template fabrication for sub-80-nm contact hole patterning using step and flash imprint lithography
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