Damage testing of partial reflectors for 157-nm laser calorimeters

Damage testing of partial reflectors for 157-nm laser calorimeters

著者名:

Laabs, H. ( National Institute of Standards and Technology (USA) )
Jones, R.D.
Cromer, C.L.
Dowell, M.L.
Liberman, V. ( MIT Lincoln Lab. (USA) )

掲載資料名:

Laser-Induced Damage in Optical Materials: 2001

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4679

発行年:

2002

開始ページ:

332

終了ページ:

338

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444189 [0819444189]

言語:

英語

請求記号:

P63600/4679

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012508
シリーズID:	PA00000029
会議名:	Laser Damege : Laser-Induced Damage in Optical Materials
回次:	2001
会議開催地:	Boulder, CO, USA
会議開催年:	2001.10.01-2001.10.02

類似資料:

1 国際会議録 New developments in excimer laser metrology at 157 nm Dowell, M.L., Jones, R.D., Laabs, H., Cromer, C.L., Morton, R.D. SPIE-The International Society for Optical Engineering	7 国際会議録 Accelerated damage to blank and antireflectance-coated CaF2 surfaces under 157-nm laser irradiation Liberman, V., Rothschild, M., Palmacci, S.T., Efremow, N.N., Jr., Sedlacek, J.H.C., Grenville, A. SPIE-The International Society for Optical Engineering
2 テクニカルペーパー Thermal Modeling of Calorimeters for Excimer Lasers at 193 nm Wavelength Chen, D.H., Dowell, M.L., Cromer, C.L., Zhang, Z.M. American Institute of Aeronautics and Astronautics	8 国際会議録 Marathon damage testing of pellicles for 193-nm lithography Grenville,A., Liberman,V., Kunz,R.R., Rothschild,M., Sedlacek,J.H.C., Uttaro,R.S. SPIE-The International Society for Optical Engineering
3 テクニカルペーパー THERMAL RESPONSE AND INEQUIVALENCE OF PULSED ULTRAVIOLET-LASER CALORIMETERS Chen,D.H., Dowell,M.L., Cromer,C.L., Zhang,Z.M. American Institute of Aeronautics and Astronautics	9 国際会議録 Behavior of candidate organic pellicle materials under 157-nm laser irradiation Grenville, A., Liberman, V., Rothschild, M., Sedlacek, J.H.C., French, R.H., Wheland, R.C., Zhang, X., Gordan, J. SPIE-The International Society for Optical Engineering
4 テクニカルペーパー New Developments in Deep Ultraviolet Laser Metrology for Photolithography. Dowell, M.L., Cromer, C.L., Jones, R.D., Keenan, D.A., Scott, T.R. Society of Manufacturing Engineers	10 国際会議録 Long-term laser durability testing of optical coatings and thin films for 157-nm lithography Liberman, V., Rorhschild, M., Palmacci, S.T., Efremow, N.N., Sedlacek, J.H.C., Grenville, A. SPIE-The International Society for Optical Engineering
5 国際会議録 193-nm detector nonlinearity measurement system at NIST Yang, S., Keenan, D.A., Laabs, H., Dowell, M.L. SPIE-The International Society for Optical Engineering	11 国際会議録 Damage testing of pellicles for 193-nm lithography Liberman,V., Kunz,R.R., Rothschild,M., Sedlacek,J.H.C., Uttaro,R.S., Grenville,A., Bates,A.K., Van,Peski,C.K. SPIE-The International Society for Optical Engineering
6 国際会議録 Long-term testing of optical components for 157-nm lithography Liberman,V., Rothschild,M., Sedlacek,J.H.C., Uttaro,R.S., Bates,A.K., Orvek,K.J. SPIE - The International Society for Optical Engineering	12 国際会議録 Surface-emitting laser diode beam characterization Jones,R.D., Obarski,G.E., Livigni,D.J., Laabs,H. SPIE-The International Society for Optical Engineering

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