Onset of laser ablation in CaF2 crystal under excimer laser irradiation

Onset of laser ablation in CaF2 crystal under excimer laser irradiation

著者名:

Kawaguchi, Y. ( National Institute of Advanceed Industrial Science and Technology (Japan) )
Narazaki, A.
Sato, T.
Niino, H.
Yabe, A.

掲載資料名:

Photon Processing in Microelectronics and Photonics

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4637

発行年:

2002

開始ページ:

13

終了ページ:

20

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819443762 [081944376X]

言語:

英語

請求記号:

P63600/4637

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012465
シリーズID:	PA00000029
会議名:	SPIE LASE : Photon processing in microelectronics and photonics
回次:	2002
会議開催地:	San Jose, CA, USA
会議開催年:	2002.01.21-2002.01.24

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