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Characterization of internal stress of silicon oxinitride thin films fabricated by plasma-enhanced chemical vapor deposition: applications in integrated optics

著者名:
掲載資料名:
Advanced photonic sensors and applications II : 27-30 November 2001, Singapore
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4596
発行年:
2001
開始ページ:
9
終了ページ:
15
総ページ数:
7
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819443267 [0819443263]
言語:
英語
請求記号:
P63600/4596
資料種別:
国際会議録

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