Understanding the forbidden pitch and assist feature placement

Understanding the forbidden pitch and assist feature placement

著者名:

Shi,X. ( ASML MaskTools, Inc. )

掲載資料名:

21st Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4562

発行年:

2001

巻:

4562

パート:

Two of Two Parts

開始ページ:

968

終了ページ:

979

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819442901 [0819442909]

言語:

英語

請求記号:

P63600/4562

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012276
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2001 : 21st
会議開催地:	Monterey, CA, USA
会議開催年:	2001.10.03-2001.10.05

類似資料:

1 国際会議録 Understanding the forbidden pitch phenomenon and assist feature placement Shi, X., Hsu, S., Chen, J.F., Hsu, M., Socha, R.J., Dusa, M.V. SPIE-The International Society for Optical Engineering	7 国際会議録 A proposal for the contact hole assist feature printing checker in IML [5853-51] Shieh, J., Socha, R., Shi, X., Chen, A. SPIE - The International Society of Optical Engineering
2 国際会議録 Forbidden pitches for 130-nm lithography and below Socha,R.J., Dusa,M.V., Capodieci,L., Finders,J., Chen,J.F., Flagello,D.G., Cummings,K.D. SPIE - The International Society for Optical Engineering	8 国際会議録 Contact and via hole mask design optimization for 65-nm technology node Van Den Broeke, D., Shi, X., Socha, R., Laidig, T., Hollerbach, U., Wampler, K. E., Hsu, S., Chen, J. F., Corcoran, N. … SPIE - The International Society of Optical Engineering
3 国際会議録 Understanding the impact of full-field mask error factor Conley,W.E., Shi,X., Hankinson,M., Dusa,M.V., Socha,R.J., Garza,C. SPIE - The International Society for Optical Engineering	9 国際会議録 Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask:?.Experimental results Socha,R.J., Shi,X., Holman,K.C., Dusa,M.V., Conley,W., Petersen,J.S., Chen,J.F., Laidig,T.L., Wampler,K.E., … SPIE - The International Society for Optical Engineering
4 国際会議録 Dual damascene photo process using negative-tone resist Shi,X., Fung,A.C., Hsu,S., Li,Z., Nguyen,T., Socha,R.J., Conley,W.E., Dusa,M.V. SPIE - The International Society for Optical Engineering	10 国際会議録 Mesa or trench type for chromeless phase-shift lithography from photolithographic performance point of view Shi, X., Chen, J.F., Hsu, S., Van Den Broeke, D.J., Socha, R.J., Chang, C.H., Dai, C.-M. SPIE-The International Society for Optical Engineering
5 国際会議録 Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node Van Den Broeke, D.J., Laidig, T.L., Chen, J.F., Wampler, K.E., Hsu, S.D., Shi, X., Socha, R.J., Dusa, M.V., Corcoran, … SPIE - The International Society of Optical Engineering	11 国際会議録 Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL) Van Den Broeke, D.J., Socha, R., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N., Hollerbach, U., Wampler, K.E., Shi, … SPIE - The International Society of Optical Engineering
6 国際会議録 Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond Hsu, S.D., Corcoran, N.P., Eurlings, M., Knose, W.T., Laidig, T.L., Wampler, K.E., Roy, S., Shi, X., Hsu, C.M., Chen, … SPIE-The International Society for Optical Engineering	12 国際会議録 Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50] Hsu, M., Van Den Broeke, D., Laidig, T., Wampler, K. E., Hollerbach, U., Socha, R., Chen, J. F., Hsu, S., Shi, X. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12