Binary mask defect printability for 130-nm ArF lithography
- 著者名:
- Lin,S.C. ( Tai Semiconductor Manufacturing Co., Ltd. )
- Chen,J.H.
- Hsu,T.H.
- Hung,J.C.C.
- Lin,J.C.H.
- 掲載資料名:
- 21st Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4562
- 発行年:
- 2001
- 巻:
- 4562
- パート:
- Two of Two Parts
- 開始ページ:
- 798
- 終了ページ:
- 812
- 総ページ数:
- 15
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819442901 [0819442909]
- 言語:
- 英語
- 請求記号:
- P63600/4562
- 資料種別:
- 国際会議録
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9
国際会議録
Lihtography process optimization for 130-nm polygate mask and the impact of mask error factor
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
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SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |