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Analysis of dry etch loading effect in mask fabrication

著者名:
Lee,J.-Y. ( Samsung Electronics Co., Ltd. )
Cho,S.-Y.
Kim,C.-H.
Lee,S.-W.
Choi,S.-W.
Han,W.-S.
Sohn,J.-M.
さらに 2 件
掲載資料名:
21st Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4562
発行年:
2001
巻:
4562
パート:
Two of Two Parts
開始ページ:
609
終了ページ:
615
総ページ数:
7
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819442901 [0819442909]
言語:
英語
請求記号:
P63600/4562
資料種別:
国際会議録

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