Photomask blank shelf-life study on e-beam chemically amplified resists

Photomask blank shelf-life study on e-beam chemically amplified resists

著者名:

Qian,F. ( Photronics, Inc. )

掲載資料名:

21st Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4562

発行年:

2001

巻:

4562

パート:

Two of Two Parts

開始ページ:

577

終了ページ:

587

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819442901 [0819442909]

言語:

英語

請求記号:

P63600/4562

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012276
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2001 : 21st
会議開催地:	Monterey, CA, USA
会議開催年:	2001.10.03-2001.10.05

類似資料:

1 国際会議録 Performance of positive-tone chemically amplified resists for next-generation photomask fabrication Segawa,T., Kurihara,M., Sasaki,S., Inomata,H., Hayashi,N., Sano,H. SPIE-The International Society for Optical Engineering	7 国際会議録 Photomask blanks enhancement by optimizing resist baking and coating for advanced e-beam reticle fabrication Higuchi,T., Kobayashi,H., Yamashiro,K., Asakawa,K., Yokoya,Y. SPIE-The International Society for Optical Engineering
2 国際会議録 Mechanistic studies of chemically amplified resists Hinsberg, W., Wallraff, G., Houle, F., Morrison, M., Frommer, J., Beyers, R., Hutchinson, J. American Chemical Society	8 国際会議録 Kinetics of chemically amplified resists G.M. Wallraff, W.D. Hinsberg, F.A. Houle, J. Opitz, D. Hopper Society of Photo-optical Instrumentation Engineers
3 国際会議録 Performance of a chemically amplified positive resist for next-generation photomask fabrication Kurihara,M., Segawa,T., Okuno,D., Hayashi,N., Sano,H. SPIE-The International Society for Optical Engineering	9 国際会議録 Acid amplification of chemically amplified resists for 193-nm lithography Ohfuji,T., Takahashi,M., Kuhara,K., Ogawa,T., Ohtsuka,H., Sasago,M., Ichimura,K. SPIE-The International Society for Optical Engineering
4 国際会議録 Application of chemically amplified resists to photomask fabrication M. Arai, H. Inomata, T. Nishimura, M. Kurihara, N. Hayashi Society of Photo-optical Instrumentation Engineers	10 国際会議録 Chemically amplified positive resist for next-generation photomask fabrication Katoh,K., Kasuya,K., Arai,T., Sakamizu,T., Satoh,H., Saitoh,H., Hoga,M. SPIE - The International Society for Optical Engineering
5 国際会議録 Mask pafferning using chemically amplified resists and the novel STEAG HamaTech blank coater ASR5000 Koepernik, C., Beyer, D., Dress, P., Hoffmann, T., Hudek, P., Irmscher, M., Krauss, C., Leibold, B., Mueller, D., … SPIE-The International Society for Optical Engineering	11 国際会議録 Influence of the baking process for chemically amplified resist on CD performance Sasaki, S., Ohfuji, T., Kurihara, M., Inomata, H., Jackson, C.A., Murata, Y., Totsukawa, D., Tsugama, N., Kitano, N., … SPIE-The International Society for Optical Engineering
6 国際会議録 A study of storage life extension for high performance chemically amplified resist coated blanks [5853-03] Yang, S.-J., Seo, S.-M., Ko, S.-H., Cha, H.-S., Kang, G.-W., Nam, K.-S., Seo. W.-W., Jung, W.-K., Cho, H.-K., Kim, … SPIE - The International Society of Optical Engineering	12 国際会議録 Effect of humidity on deprotection kinetics in chemically amplified resists Burns, S.D., Medeiros, D.R., Johnson, H.F., Wallraff, G.M., Hinsberg, W.D., Willson, C.G. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12