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Dry etching characteristics of attenuated phase-shifting masks using Cl2/CF4/O2/He plasmas

著者名:
Choi,S.J. ( PKL )
Cha,H.-S.
Yoon,S.-Y.
Jung,S.-M.
Choi,S.-S.
Jeong,S.-H.
さらに 1 件
掲載資料名:
21st Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4562
発行年:
2001
巻:
4562
パート:
Two of Two Parts
開始ページ:
561
終了ページ:
570
総ページ数:
10
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819442901 [0819442909]
言語:
英語
請求記号:
P63600/4562
資料種別:
国際会議録

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