Inspection and repair of EUV

Inspection and repair of EUV

著者名:

Fisch,E. ( IBM Microelectronics Div. )
Kindt,L.
Lercel,M.J.
Schmidt,M.R.

掲載資料名:

21st Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4562

発行年:

2001

巻:

4562

パート:

One of Two Parts

開始ページ:

480

終了ページ:

485

総ページ数:

6

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819442901 [0819442909]

言語:

英語

請求記号:

P63600/4562

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012276
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2001 : 21st
会議開催地:	Monterey, CA, USA
会議開催年:	2001.10.03-2001.10.05

類似資料:

1 国際会議録 EPL mask fabrication Lercel, M.J., Williams, C.T., Lawliss, M., Ackel, R., Kindt, L., Fisch, E. SPIE-The International Society for Optical Engineering	7 国際会議録 Evaluation and comparison of the pattern transfer-induced image placement distortions on e-beam projection lithography masks Magg,C., Lercel,M.J., Lawliss,M., Ackel,R., Caldwell,N., Kindt,L., Racette,K.C., Williams,C., Reu,P.L. SPIE-The International Society for Optical Engineering
2 国際会議録 Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC Racette, K.C., Williams, C.T., Fisch, E., Kindt, L., Lawliss, M., Ackel, R., Lercel, M.J. SPIE-The International Society for Optical Engineering	8 国際会議録 Analysis of critical parameters for EPL mask fabrication (Invited Paper) Lercel, M.J. SPIE-The International Society for Optical Engineering
3 国際会議録 EUVL mask fabrication for the 45-nm node Fisch, E., Kindt, L., Lercel, M.J., Racette, K.C., Williams, C.T. SPIE-The International Society for Optical Engineering	9 国際会議録 Photomask repair using an advanced laser-based repair system (MARS2) Schmidt, M.R., Flanigan, P., Thibault, D. SPIE-The International Society for Optical Engineering
4 国際会議録 Mask availability for next-generation lithography Lercel, M.J., Fisch, E., Racette, K.C., Lawliss, M., Williams, C. T., Kindt, L., Huang, C. SPIE-The International Society for Optical Engineering	10 国際会議録 Process for improved reflectivity uniformity in extreme-ultraviolet lithography (EUVL) masks Thiel, C., Racette, K.C., Fisch, E., Lawliss, M., Kindt, L., Huang, C., Ackel, R., Levy, M. SPIE-The International Society for Optical Engineering
5 国際会議録 UV inspection of EUV and SCALPEL reticles Pettibone,D.W., Bareket,N., Liang,T., Stivers,A.R., Hector,S.D., Mangat,P.J.S., Resnick,D.J., Lercel,M.J., Lawliss,M., … SPIE-The International Society for Optical Engineering	11 国際会議録 Effect of reduction ratio on polarization impact for imaging Gordon, R.L., Brunner, T.A., Seong, N., Lercel, M.J., Gallatin, G.M. SPIE - The International Society of Optical Engineering
6 国際会議録 Inspection of EUV reticles Pettibone, D.W., Veldman, A., Liang, T., Stivers, A.R., Mangat, P.J., Lu, B., Hector, S.D., Wasson, J.R., Bleadel, K.L., … SPIE-The International Society for Optical Engineering	12 国際会議録 Imaging capabilities of proximity x-ray lithography at 70-nm ground rules Krasnoperova,A.A., Rippstein,R.P., Flamholz,A.L., Kratschmer,E., Wind,S., Brooks,C.J., Lercel,M.J. SPIE - The International Society for Optical Engineering

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