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Alternating phase shifting mask implementation to 0.1-μm logic gates

著者名:
Chang,C.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. )
Tzu,S.-D.
Hsieh,C.-H.
Dai,C.M.
Lin,B.J.
Lin,C.-H.
Liu,H.-Y.
さらに 2 件
掲載資料名:
21st Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4562
発行年:
2001
巻:
4562
パート:
One of Two Parts
開始ページ:
368
終了ページ:
378
総ページ数:
11
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819442901 [0819442909]
言語:
英語
請求記号:
P63600/4562
資料種別:
国際会議録

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