Pattern generation with SLM imaging

Pattern generation with SLM imaging

著者名:

Sandstrom,T. ( Micronic Laser Systems AB )
Askebjer,P.
Sallander,J.
Zerne,R.
Karawajczyk,A.

掲載資料名:

21st Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4562

発行年:

2001

巻:

4562

パート:

One of Two Parts

開始ページ:

38

終了ページ:

44

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819442901 [0819442909]

言語:

英語

請求記号:

P63600/4562

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012276
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2001 : 21st
会議開催地:	Monterey, CA, USA
会議開催年:	2001.10.03-2001.10.05

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1 国際会議録 Laser PG performance for 100-nm photomasks Rosling, M., Karawajczyk, A., Askebjer, P., Zerne, R., Carroll, A.M., Eklund, R., Fosshaug, H., Sandstrom, T. SPIE-The International Society for Optical Engineering	7 国際会議録 A high-end mask writer using a spatial light modulator (Invited Paper) Ljungblad, U.B., Askebjer, P., Karlin, T., Sandstrom, T., Sjoberg, H. SPIE - The International Society of Optical Engineering
2 国際会議録 Improved photomask accuracy with a high-productivity DUV laser pattern generator [6349-34] ostrom, T., Mahlen, J., Karawajczyk, A., Rosling, M., Carlqvist, P., Askebjer, P., Karlin, T., Sallander, J., osterberg, … SPIE - The International Society of Optical Engineering	8 国際会議録 Results from a new laser pattern generator foe 180-nm photomasks Vikholm,T., Kjellberg,L., Askebjer,P., Haddleton,S., Larsson,J., Bjuggren,M. SPIE - The International Society for Optical Engineering
3 国際会議録 Pattern accuracy and throughput optimization for an SLM-based 248-nm DUV laser mask pattern generator Sjoberg, H., Chauvet, J.-M., Harkesjo, J., Hogfeldt, P., Karawajczyk, A., Karlsson, J., Kjellberg, L., Mahlen, J., … SPIE - The International Society of Optical Engineering	9 国際会議録 Controlling CD variations in a massively parallel pattern generator Luberek, J.Z., Carroll, A.M., Sandstroem, T., Karawajczyk, A. SPIE-The International Society for Optical Engineering
4 国際会議録 Second level exposure for phase shift mask applications using an SLM-based DUV mask writer [5853-134] Chandramouli, M., Olshausen, B., Korobko, Y., Henrichs, S., Qu, P., Ma, J., Auches, B., Cole, D., Ostrom, T., Beyerl, … SPIE - The International Society of Optical Engineering	10 国際会議録 CD performance of a new high-resolution laser pattern generator Liden,P., Vikholm,T., Kjeilberg,L., Bjuggren,M., Edgren,K.A., Larsson,J., Haddleton,S., Askebjer,P. SPIE - The International Society for Optical Engineering
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6 国際会議録 Rasterizing for SLM-based mask making and maskless lithography Martinsson, H., Sandstrom, T. SPIE - The International Society of Optical Engineering	12 国際会議録 Printing sub-100-nm random logic patterns using binary masks and synthetic-aperture lithography (SAL) Sandstrom,T. SPIE-The International Society for Optical Engineering

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