Extended capability of laser writer for masks beyond 180-nm nodes

Extended capability of laser writer for masks beyond 180-nm nodes

著者名:

Cho,S.-Y. ( Samsung Electronics Co., Ltd. )

掲載資料名:

21st Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4562

発行年:

2001

巻:

4562

パート:

One of Two Parts

開始ページ:

9

終了ページ:

15

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819442901 [0819442909]

言語:

英語

請求記号:

P63600/4562

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012276
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2001 : 21st
会議開催地:	Monterey, CA, USA
会議開催年:	2001.10.03-2001.10.05

類似資料:

1 国際会議録 Ecperimental study on the possibility of chemically amplified resists for mask production for device generations < 180 nm Kim,C.-H., Jeon,C.-U., Choi,S.-W., Han,W.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering	7 国際会議録 Full-chip application for SRAM gate at 100-nm node and beyond using chromeless phase lithography Park, J.-S., Kim, S.-H., Shin, I.-K., Choi, S.-W., Sohn, J.-M., Lee, J.-H., Shin, H.-S., Laidig, T.L., Van den Broeke, … SPIE - The International Society of Optical Engineering
2 国際会議録 EUV mask pattern inspection for memory mask fabrication in 45-nm node and below [6349-95] Kim, D. Y., Cho, S. Y., Kim, H., Huh, S. M., Chung, D. H., Cha, B. C., Lee, J. W., Choi, S. W., Han, W. S., Park, K. H., … SPIE - The International Society of Optical Engineering	8 国際会議録 Comparative study on MEEF and dose latitude between attenuated PSM and Cr Binary masks Cho,H.-J., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M. SPIE - The International Society for Optical Engineering
3 国際会議録 Analysis of dry etch loading effect in mask fabrication Lee,J.-Y., Cho,S.-Y., Kim,C.-H., Lee,S.-W., Choi,S.-W., Han,W.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering	9 国際会議録 Study of mask structure for 45-nm node based on manufacturability and lithographic performance J. G. Doh, C. H. Park, Y. S. Moon, B. H. Kim, S. W. Kwon, S. Y. Choi, S. H. Kim, S. Y. Kim, B. G. Kim, S. G. Woo, H. K. … SPIE - The International Society of Optical Engineering
4 国際会議録 Optical performance enhancement technique for 45-nm-node with binary mask J. Jung, H. Kim, J. Lee, S. Choi, W. Han SPIE - The International Society of Optical Engineering	10 国際会議録 Mask considerations for manufacturing assist features Choi,J.-H., Cho,W.-I., Kim,B.-S., Yang,S.-H., Moon,S.-Y., Choi,S.-W., Han,W.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering
5 国際会議録 Vacuum delay effect of CAR in mask fabrication Kim,C.-H., Jeon,C.-U., Han,S.-J., Cho,W.-I., Choi,S.-W., Han,W.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering	11 国際会議録 Current status of mask CD uniformity as related to e-beam system Lim,S.-C., Kim,B.-G., Choi,S.-W., Lee,K.-H., Cho,H.-J., Yu,Y.-H., Cho,H.-K., Sohn,J.-M. SPIE-The International Society for Optical Engineering
6 国際会議録 Required mask specification for mass production devices below 65-nm design node [6349-81] Nam, D., Choi, S., Doh, J., Noh, Y., Lee, H., Sin, Y., Kim, B., Kang, M., Han, W. SPIE - The International Society of Optical Engineering	12 国際会議録 Effect of mask reduction ratio in alternating phase-shift masks Shin,I.-G., Lee,S.-W., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M., Lim,T.-K. SPIE-The International Society for Optical Engineering

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