Whole wafer critical point drying of MEMS devices

Whole wafer critical point drying of MEMS devices

著者名:

Resnick,P.J. ( Sandia National Labs. )
Clews,P.J.

掲載資料名:

Reliability, testing, and characterization of MEMS/MOEMS : 22-24 October 2001, San Trancisco, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4558

発行年:

2001

開始ページ:

189

終了ページ:

196

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819442864 [0819442860]

言語:

英語

請求記号:

P63600/4558

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012272
シリーズID:	PA00000029
会議名:	Micromachining and Microfabrication : Reliability, Testing, and Characterization of MEMS/MOEMS
回次:	2001
会議開催地:	San Francisco, CA, USA
会議開催年:	2001.10.22-2001.10.24

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