Stiction-free release etch with anhydrous HF/water vapor processes
- 著者名:
- Hanestad,R. ( FSI International )
- Butterbaugh,J.W.
- Ben-Hamida,A.
- Gelmi,I.
- 掲載資料名:
- Micromachining and microfabrication process technology VII : 22-24 October 2001, San Francisco, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4557
- 発行年:
- 2001
- 開始ページ:
- 58
- 終了ページ:
- 68
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819442857 [0819442852]
- 言語:
- 英語
- 請求記号:
- P63600/4557
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
IMAPS |
Electrochemical Society |
Electrochemical Society |
MRS - Materials Research Society |
Electrochemical Society |
SPIE - The International Society for Optical Engineering |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
12
国際会議録
A HF VAPOUR ETCH PROCESS FOR INTEGRATION IN CLUSTER-TOOL PROCESSES: CHARACTERISTICS AND APPLICATIONS
Electrochemical Society |