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Improved reflectance and stability of Mo/Si multilayers

著者名:
Bajt,S. ( Lawrence Livermore National Lab. )
Alameda,J.B.
Barbee Jr.,T.W.
Clift,W.M.
Folta,J.A.
Kaufmann,B.B.
Spiller,E.A.
さらに 2 件
掲載資料名:
Soft X-ray and EUV imaging systems II : 31 July-1 August 2001, San Diego, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4506
発行年:
2001
開始ページ:
65
終了ページ:
75
総ページ数:
11
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819442208 [0819442208]
言語:
英語
請求記号:
P63600/4506
資料種別:
国際会議録

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