Pushing releability limits in SiO2: an extension to gate oxide scaling

Pushing releability limits in SiO2: an extension to gate oxide scaling

著者名:

Roy,P.K. ( Lucent Technologies/Bell Labs. )
Chen,Y.
Chetlur,S.

掲載資料名:

Photonics 2000 : International Conference on Fiber Optics and Photonics : 18-20 December 2000, Calcutta, India : proceedings

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4417

発行年:

2000

開始ページ:

161

終了ページ:

171

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819441249 [0819441244]

言語:

英語

請求記号:

P63600/4417

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012132
シリーズID:	PA00000029
会議名:	International Conference on Fiber Optics and Photonics
回次:	2000
会議開催地:	Calcutta, India
会議開催年:	2000.12.18-2000.12.20

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