Photomask quality control by Virtual Stepper system for subwavelength photomasks

Photomask quality control by Virtual Stepper system for subwavelength photomasks

著者名:

Karklin,L. ( Numerical Technologies, Inc. )
Mazor,S.

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology VIII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4409

発行年:

2001

開始ページ:

512

終了ページ:

517

総ページ数:

6

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819441119 [0819441112]

言語:

英語

請求記号:

P63600/4409

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012125
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2001 : 8th
会議開催地:	Yokohama, Japan
会議開催年:	2001.04.25-2001.04.27

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1 国際会議録 Subwavelength lithography: an impact of photomask errors on cricuit performance Karklin, L., Mazor, S., Joshi, D., Balasinski, A., Axelrad, V. SPIE-The International Society for Optical Engineering	7 国際会議録 Mask manufacturability issues for subwavelength lithography Karklin, L., Rachlin, K. E. SPIE - The International Society of Optical Engineering
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6 国際会議録 Lithographic analysis of distributed photomask defects: II. Random mask CD errors Karklin, L. SPIE-The International Society for Optical Engineering	12 国際会議録 Defect printability analysis study using virtual stepper system in a production environment Chiou, S.Y., Lei, H., Liu, W.J., Chu, M.J., Chiang, D., Tuan, S., Hong, C.-L., Chang, M., Chen, J.-H., Chan, K.K., Qian, … SPIE-The International Society for Optical Engineering

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